Photosensitive Ligand Chemistries for Direct Patterning of Colloidal Nanocrystals
Jia-Ahn Pan a, Dmitri Talapin b, Emory Chan c
a Scripps College, 925 N Mills Ave, Claremont, United States
b University of Chicago, 929 East 57th st, Chicago, 60637, United States
c (Lawrence Berkeley National Laboratory
Poster, Jia-Ahn Pan, 032
Publication date: 15th May 2025

The application of colloidal nanocrystals (NCs) in sophisticated, multi-material devices is held back by challenges in localizing NCs with micro/nano-meter precisions and good reproducibility. Therefore, suitable approaches to pattern NCs must be established to transition from individual proof-of-concept NC devices to integrated and multiplexed technological systems. Our research focuses on developing light-sensitive ligands that enable a variety of NCs (II-VI NCs, metal oxide NCs, perovskite NCs, upconverting nanoparticles, etc.) to be patterned directly with good pattern fidelity while retaining desirable properties. Given that each type of NC possesses unique surface chemistries and properties, we investigate various classes of photosensitive ligands that are suitable for each NC and its applications. We also work toward elucidating these patterning mechanisms by exploring how these photo-induced chemical reactions lead to changes in NC dispersibility. Finally, we utilize these patterning chemistries for the fabrication of various optoelectronic devices, such as photodetectors, diffractive optical elements, and photoswitches. 

© FUNDACIO DE LA COMUNITAT VALENCIANA SCITO
We use our own and third party cookies for analysing and measuring usage of our website to improve our services. If you continue browsing, we consider accepting its use. You can check our Cookies Policy in which you will also find how to configure your web browser for the use of cookies. More info