Quantifying Residual Chloronaphthalene Solvent Additive in PM6:Y6 Organic Photovoltaic Blends via Chlorine K-edge NEXAFS Spectroscopy
XU HUANG a
a Monash University, Wellington Road, Clayton, Australia
Proceedings of International Conference on Hybrid and Organic Photovoltaics (HOPV26)
Uppsala, Sweden, 2026 May 18th - 20th
Organizers: Gerrit Boschloo, Ellen Moons, Feng Gao and Anders Hagfeldt
Poster, XU HUANG, 214
Publication date: 11th March 2026

The PM6:Y6 blend serves as a benchmark for high-efficiency organic photovoltaics (OPVs), where solvent engineering and liquid additives are critical for tailoring film morphology. Here, we focus on quantifying residual solvent additive CN (chloronaphthalene) in PM6:Y6 films using chlorine K-edge Near-Edge X-ray Absorption Fine-Structure (NEXAFS) spectroscopy— an element-specific, ambient-pressure operable, chemically sensitive technique—and systematically investigate the impact of CN (vs. reference solvents including chloroform and chlorobenzene) on film morphology and its influence on charge generation, extraction, and overall device performance. Morphological characterization is performed via atomic force microscopy (AFM) and grazing incidence wide-angle X-ray scattering (GIWAXS): we find that residual CN modulates phase separation kinetics, promoting the formation of bicontinuous networks with ~20 nm domain sizes (a structure favourable for charge transport). Our work highlights the value of targeted residual additive quantification (via NEXAFS) in understanding morphology evolution of PM6:Y6 blends, laying a solid foundation for optimizing OPV film fabrication and long-term operational stability.

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