Publication date: 8th January 2019
We show that controlling CSA deposition parameters such as speed and substrate temperature leads to optimized microstructure of poly (3-hexylthiophene), poly (3-(2′-ethyl) hexylthiophene), poly(3-hexylselenophene), poly[2, 5 - bis(3 - tetradecylthiophen -2-yl)thieno[3, 2 - b]thiophene] and poly[(5, 6 - difluoro - 2, 1 , 3 - benzothiadiazole - 4, 7 - diyl) - alt - (3, 3’’’-di(2 - octyldodecyl) -2,2’;5’,2’’;5’’,2’’’-quaterthiophen- 5, 5’’’-diyl)] systems both in neat films and in blends when coupled with a new electron accepting polyfullerene. Moreover, in blend films we have found a correlation between the processing speed, the resulting microstructure (as revealed by AFM) and the alteration of photoluminescence (as revealed by the photoluminescence spectroscopy). Photoluminescence quenching was more intense for lower deposition speeds most probably due to a more favorable mixing of the two donor-acceptor systems in the resulting bulk heterojunction comprised of crystalline networks of polymer donor domains around molecular size intercalated with polyfullerene domains of similar size.
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