Publication date: 4th October 2024
Lead halide perovskites (LHPs) have captivated the scientific community for their extraordinary optoelectronic properties [1], offering immense potential for breakthroughs in devices such as photodetectors (PDs) [2,3], lasers, light-emitting diodes (LEDs), and memristors [4,5]. However, a persistent challenge lies in integrating these materials into CMOS-compatible device architectures without compromising their performance or scalability. In this study, we introduce a robust and universal fabrication approach leveraging standard lithographic techniques to produce high-performance LHP PDs capable of separate red (R), green (G), and blue (B) color detection. By carefully optimizing the device architecture and employing a single-step lithography combined with pulsed argon (Ar) milling, we achieve pixelated PDs with remarkable performance metrics. These include a responsivity of 0.3 A /W, an ultra-low dark current density of less than 10-6 mA/cm-2, detectivity exceeding 1013 Jones, and sub-20 ns fall times without external bias. This method not only ensures high device efficiency but also provides a scalable and straightforward solution for the integration of perovskite-based optoelectronics into CMOS-compatible platforms. The versatility and effectiveness of this approach highlight its transformative potential in advancing next-generation image sensors and other perovskite-based technologies, bridging the gap between laboratory research and practical applications.
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