Publication date: 17th July 2025
Vapor-phase deposition techniques are widely used in the semiconductor industry. In the case of metal halide perovskites (MHPs), vapor deposition is also being explored as a solvent-free method, avoiding the use of toxic solvents. However, the complex compositions of MHPs, often involving precursors with vastly different volatilities, require strategies where each precursor is evaporated independently or alternative approaches that enable out-of-equilibrium vaporization of all precursors simultaneously. Among physical vapor deposition (PVD) methods, pulsed laser deposition (PLD) stands out as a promising yet underexplored technique for MHPs. PLD utilizes laser energy to eject material from a target through both thermal and non-thermal processes. This enables high versatility in target composition, allowing the deposition of complex thin films from a single-source target. In this presentation, we highlight recent advances in the PLD of MHPs. We discuss methods enabling compositional flexibility, ranging from inorganic to hybrid compounds, as well as optimization strategies for polymorph control. These include the transition from polycrystalline to epitaxial monocrystalline layers, the development of 2D structures, and the fabrication of porous scaffolds for hybrid vapor-vapor or vapor-solution growth. We also address the challenges of PLD and present approaches for scaling up this method. Furthermore, we explore how insights gained from PLD can be transferred to more industry-standard techniques such as sputtering deposition.
Ref.
https://doi.org/10.1021/acsenergylett.4c01466
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