High Deposition Rates of Metal Halide Perovskites: Encountered Limitations with Pulsed Laser Deposition
Joel Arriaga-Dávila a, Vojta Kliner a, Monica Morales-Masis a
a NanoLab, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
Proceedings of MATSUS Fall 2025 Conference (MATSUSFall25)
A5 Advances in Vacuum and Hybrid Deposition of Halide Perovskite - #PeroVac
València, Spain, 2025 October 20th - 24th
Organizers: Annalisa Bruno, Monica Morales Masis and Kassio Zanoni
Poster, Joel Arriaga-Dávila, 468
Publication date: 21st July 2025

Pulsed laser deposition, a physical vapor deposition method, has demonstrated clear suitability for growing metal halide perovskites for photovoltaic applications. From single-source processing to template-assisted growth, pulsed laser deposition enables the fabrication of perovskite thin films with excellent uniformity, precise thickness control, and potential for high-throughput manufacturing. Particular emphasis is placed on the former characteristic, given its critical relevance to scaling up perovskite-based photovoltaics. Early studies using physical vapor deposition methods to accelerate perovskite growth successfully achieved higher deposition rates but also highlighted inherent limitations, such as reduced crystal orientation and compromised film quality. Building on these observations, this work investigates the intrinsic challenges of high deposition rates in pulsed laser deposition at higher frequencies (e.g., (non)preferential growth, macroparticle formation, surface morphology, and stoichiometric/compositional deviations) and examines their impact on overall device functionality. Finally, strategies to overcome these limitations are proposed, providing perspective for further exploration of laser-based vacuum deposition for metal halide perovskites.

This project was financed by the Dutch Nationaal Groeifonds through the SolarNL national consortium under the SolarLab research and innovation program.

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