Publication date: 21st July 2025
As perovskite device efficiencies near those of crystalline silicon, scalable, low-toxicity manufacturing becomes critical. Dry processing, especially sputtering, offers a direct route to large-area, industry-compatible deposition. We report the first step of a PVD-centered process flow towards wide band gap perovskite for tandems: template engineering of an RF-magnetron-sputtered PbI₂:CsBr scaffold. We focus on tuning porosity and connectivity of the inorganic template, which govern subsequent conversion and halide/organic infiltration. By mapping the sputter window, (working pressure, RF power, and target composition) we tailor film microstructure and elemental composition. Template quality is assessed by XRD (phase purity/preferred growth), AFM/SEM (roughness, morphology, thickness), and UV-Vis (optical thickness). We further address preferential sputtering, re-sputtering mitigation, and halide stoichiometry control to pre-set Cs and overall halide content prior to conversion. These results establish the initial process window for porous, conversion-ready Pb-halide films, paving the way toward vacuum-only fabrication of wide-bandgap perovskite absorbers for monolithic tandems.
This project was financed by the dutch Nationaal Groeifunds through SolarNL consortium under the SolarLab research and innovation program.
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