Publication date: 15th December 2025
Colloidal quantum dots (CQDs) offer size-, shape-, and composition-tunable electronic and optical properties thus being used in a wide array of devices ranging from solar cells to light-emitting diodes. However, most of these applications are limited to the visible and near infrared (IR) region of the electromagnetic spectrum. In this talk, we will present our recent efforts to push the envelope of the applicability of these CQDs towards short-wave and extended short wave IR applications. These CQD-based photodetectors present a promising path toward fabricating IR imagers at significantly reduced cost and complexity compared to state-of-the-art epitaxial grown quantum-well IR devices. However, their progress has been constrained by reliance on restricted heavy metals and by manufacturing bottlenecks that limit quality control and throughput. Herein, we report advances in CQD chemistry, patterning, deposition and device design that collectively overcome some of these challenges. We develop a solution-phase RoHS compliant IR-sensitive Ag2Se CQD ink that forms crack-free photodiodes with competitive sensitivity and microsecond response times. A direct CQD lithography platform achieves μm resolution and enables patterned devices, including a quad-band detector for multispectral NIR–SWIR imaging. To address process scalability, we introduce an automated, materials-efficient, layer-by-layer fabrication method that yields uniform, large-area films compatible with high-throughput manufacturing. Finally, we demonstrate a hybrid organic/inorganic electrode with low sheet resistance and broadband IR transparency, surpassing conventional oxide contacts and allowing for unique top illuminated IR devices. Together, these developments chart a scalable and environmentally responsible pathway toward next-generation IR photodetectors, illustrating how nanoscale design principles can reshape technologies once constrained by complex epitaxial growth.
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