Proceedings of nanoGe Fall Meeting19 (NFM19)
Publication date: 18th July 2019
Semiconductor nanocrystals (NCs) or quantum dots (QDs) offer a flexible platform for many applications. The library of available semiconductor materials has expanded tremendously over the last years to include the more “classical” II-VI and IV-VI semiconductor nanocrystals as well as III-V and perovskites. With a tunable size and surface chemistry, the crystals can be designed to offer desired properties in terms of e.g. light absorption and emission, conductivity and charge carrier mobilities, as well as being solution processable. A final way of tuning the properties of the QDs is to pattern them in nano- or microstructures that give rise to collective behavior. In this work we present a simple direct patterning technique with e-beam lithography to pattern QDs directly at the nanoscale. We use the electron beam to pattern nanostructures directly from the thin films. We present several examples of nanostructures and show that the resolution can be on the order of tens of nanometers, with roughness down to the single-particle level. The technique is versatile and can be universally applied to different material systems like CdSe and CsPbBr3, without affecting their luminescent properties. The chemical mechanism responsible for the observed solubility switch is investigated. We believe this technique shows promise for manufacturing of photonic structures at high volume, directly from the active materials.
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