Spatial Atomic Layer Deposition of Oxide Thin Films for Tandem Photovoltaics
Robert Hoye a
a Inorganic Chemistry Laboratory, University of Oxford, UK
Proceedings of MATSUS Fall 2026 Conference (MATSUSFall26)
A2 Multijunction Halide Perovskite Solar Cells: Materials, Device Design, and Advanced Characterization
Palma, Spain, 2026 October 26th - 30th
Organizers: Philip Schulz and Stefan Weber
Invited Speaker, Robert Hoye, presentation 059
Publication date: 22nd July 2026

Perovskite-silicon tandem solar cells are now entering into commercial production, but present several manufacturing challenges. Some of these challenges arise from the limited thermal processing budget of the metal-halide perovskite sub-cells, where the halide perovskite itself and organic charge transport layers readily undergo degradation when processed at >100 C for extended periods of time. In this talk, I discuss the possibilities enabled through the use of spatial atomic layer deposition (SALD) for depositing oxides used as buffer layers, encapsulation, and transparent conducting electrodes in perovskite-silicon tandems. 

SALD allows the growth of oxide thin films with similar conformality, uniformity, density and electronic properties as conventional ALD, but with an order of magnitude shorter processing time [1]. This is achieved through the spatial separation of the organometallic and oxidant precursors in a gas manifold, where the substrate (e.g., perovskite device) is oscillated repeated through the gas channels, and the number of oscillations controls the thickness of the film. Such a growth method does not require vacuum, and can readily be scaled-up to grow over large area (e.g., see nanoprintinnovations.com). By shortening the processing time, we demonstrate how a wider range of processing temperatures can be used to grow oxide buffer layers onto perovskite devices, even thermally-sensitive compositions. These oxides include n-type oxides for p-i-n structure solar cells, as well as p-type Cu2O films for n-i-p structured perovskite solar cells, and we show that these oxides successfully protect the device from mechanical damage during sputter deposition of the transparent top electrode. 

Another critical layer in tandems is the recombination contact required to monolithically connect sub-cells together electrically. We demonstrate the use of SALD to grow H:In2Othin films, where we achieve 7.2 Ohm/sq sheet resistance. Commercial sputter-deposited indium tin oxide has 13 Ohm/sq sheet resistance, and a transmittance that diminishes toward the near-infrared (NIR). By contrast, H:In2O3 achieves low resistivity through high mobility rather than high carrier concentration, and we show that the NIR transmittance is maintained at 89%, important for minimising parasitic optical losses to the low-gap sub-cell. We use nano-SIMS, TEM-EDX, XPS and ToF-ERDA measurements to understand the doping mechanism in H:In2O3.

Finally, I will discuss our emerging efforts at using nanolaminate oxide layers grown by SALD for encapsulation. With a stack of 5 layers of AlOx and ZnO grown at 100 C, a water vapour transmission rate of 10-5 g m-2 day-1. Using this stack on top of a perovskite solar cell that is encapsulated with glass improves the damp-heat stability from T80 after 1200 h (without nanolaminate stack) to T100 after 1200 h (with nanolaminate stack).

Overall, this talk demonstrates the utility of SALD for perovskite-based tandem fabrication to improve efficiency and stability. 

I thank the Engineering and Physical Sciences Research Council (EPSRC) and National Science Foundation (NSF) for support through an ECCS-EPSRC collaborative grant (EPSRC no. EP/Y032942/1 and NSF no. ECCS-2313755). I also thank the Science & Technology Facilities Council and Royal Academy of Engineering for support through a Senior Research Fellowship (no. RCSRF/2324-18-68). I also thank the SCGC for support through an SCGC-FIRST grant. 

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